半導體實驗
Semiconductor Lab.
| 節 | 週一 |
|---|---|
5 13:20–14:10 | 半導體實驗 EE210（光復） 4 節連堂 |
6 14:20–15:10 | |
7 15:30–16:20 | |
8 16:30–17:20 |
* 根據陽明交大上課時間表所列
This course provides students with hands-on experience in fabrication and characterization of semiconductor devices, where they will actively participate in the MOS capacitor and P-N junction fabrication process. The curriculum includes both theoretical lectures and practical experiments at TSRI to deepen understanding of the fundamental physics of semiconductor devices and processes. Key topics include cleaning, oxidation, deposition, lithography, etching, doping, annealing, and device characterization. Students will also engage in site visits to TSMC Newcomer Training Center (NTC) in Taichung. The course culminates in a written exam and final presentation, where students showcase their understanding and results from the practical exercises conducted throughout the semester.
No prerequisites
無備註
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實驗課和參訪出席 50% (一次未出席-25%) 期中考 20% 期末作業 15% 期末報告 15%
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| 週次 | 主題 |
|---|---|
| 第 1 週 | -Introduction of this course -Flow of MOS capacitor and P-N junction -History of TSRI & NFC 2025-02-17(一) |
| 第 2 週 | -Safety issues -Clean room environment -Clean process 2025-02-24(一) |
| 第 3 週 | -Oxidation process -Deposition process 2025-03-03(一) |
| 第 4 週 | @TSRI -Wet clean -CVD -PVD -ALD 2025-03-10(一) |
| 第 5 週 | -Lithography process -Etch process -CMP process 2025-03-17(一) |
| 第 6 週 | @TSRI -Lithography 2025-03-24(一) |
| 第 7 週 | @TSRI -dry etching -ALE -CMP 2025-03-31(一) |
| 第 8 週 | -Diffusion process -TSMC NTC introduction 2025-04-07(一) |
| 第 9 週 | @TSRI -Impanter -Diffusion -Laser -RTA 2025-04-14(一) |
| 第 10 週 | -Written exam (only one) 2025-04-21(一) |
| 第 11 週 | 4/26 (Sat.) @TSMC NTC (Taichung) -Visiting1 2025-04-28(一) |
| 第 12 週 | 5/3 (Sat.) @TSMC NTC (Taichung) -Visiting2 2025-05-05(一) |
| 第 13 週 | -MOS capacitor and P-N junction measurements -Introduction of final report/presentation 2025-05-12(一) |
| 第 14 週 | @TSRI -I-V & C-V measurement 2025-05-19(一) |
| 第 15 週 | (No class) -Preparation of final report/presentation 2025-05-26(一) |
| 第 16 週 | -Final report presentation 2025-06-02(一) |
Handouts, Reference list: Hong Xiao, “Introduction to Semiconductor Manufacturing Technology”, 2000, Prentice Hall. J. D. Plummer, M. D. Deal, and P. B. Griffin, “Silicon VLSI Technology-Fundamentals, Practice and Modeling”, 2000, Prentice Hall. S. M. Sze, “Semiconductor Devices Physics and Technology”, 2nd Ed., 2002, J. Wiley & Sons Inc.
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