半導體製造技術導論
Introduction to Semiconductor Manufacturing Technology
| 節 | 週五 |
|---|---|
5 13:20–14:10 | 半導體製造技術導論 3 節連堂 |
6 14:20–15:10 | |
7 15:30–16:20 |
* 根據陽明交大上課時間表所列
Including the presetting of the semiconductor process, the explanation of the characteristics of the material, the process flow of the semiconductor device and the explanation of the corresponding process: Crystal Growth, Wafer Fabrication and Properties of Silicon Wafers, Clean Rooms and Wafer Cleaning, Lithography, Oxidation, Diffusion, Ion Implantation, Deposition, Etching, Backend Processes.
Basic knowledge of semiconductor devices / Electronic and Optoelectronic Materials
無備註
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Home work/Lab: 20% Mid-Term Examination 30% Final Examination (close book) 50%
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| 週次 | 主題 |
|---|---|
| 第 1 週 | Introduction and practical guide to semiconductor processing 2026-02-27(五) |
| 第 2 週 | Semiconductor materials and process chemicals 2026-03-06(五) |
| 第 3 週 | Semiconductor properties 2026-03-13(五) |
| 第 4 週 | Crystal growth 2026-03-20(五) |
| 第 5 週 | Clean rooms and wafer cleaning 2026-03-27(五) |
| 第 6 週 | Manufacturing wafers and substrate engineering 2026-04-03(五) |
| 第 7 週 | Contamination control and yield 2026-04-10(五) |
| 第 8 週 | Oxidation 2026-04-17(五) |
| 第 9 週 | Mid-Term Exam 2026-04-24(五) |
| 第 10 週 | Photolithography processes 2026-05-01(五) |
| 第 11 週 | Diffusion 2026-05-08(五) |
| 第 12 週 | Ion Implantation 2026-05-15(五) |
| 第 13 週 | Deposition 1 2026-05-22(五) |
| 第 14 週 | Deposition 2 2026-05-29(五) |
| 第 15 週 | Metallization 2026-06-05(五) |
| 第 16 週 | Etching 2026-06-12(五) |
| 第 17 週 | Process Integration 2026-06-19(五) |
| 第 18 週 | Final Exam 2026-06-26(五) |
Silicon VLSI Technology - Fundamentals, Practice and Modeling- Plummer, Deal and Griffin, Upper Saddle River, NJ: Prentice Hall, 2000. Introduction to Semiconductor Manufacturing Technology – Hong Xiao: SPIE Press, 2012.
- 地點
- VNU-HUS
- 時間
- Friday 17:00-18:00
- 聯絡方式
- phamnguyenhai@hus.edu.tw